Autoclave vacuum system and filter
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Abstract
An autoclave vacuum system uses two vacuum sources to selectively impart a vacuum. In an exemplary embodiment, the vacuum sources are different types, wherein the first vacuum source is a vacuum pump, and the second source is a Venturi vacuum. The autoclave vacuum system uses a valve system for controlling whether the first and/or second vacuum sources are fluidly coupled to the vacuum enclosure. The valve system allows the autoclave vacuum system to assume a plurality of different configurations chosen such that a constant desired pressure is attained in the autoclave. The valve system may be triggered by a control system configured to recognize and act upon autoclave requirements such as temperature, pressure, duration of use, and number of cycles.
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Application No: 18/654,347 filed May 3, 2024. Patent No: US 20240367128 A1 granted November 7, 2024.
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European Patent Office
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https://worldwide.espacenet.com/patent/search/family/093293681/publication/US2024367128A1?q=pn%3DUS2024367128A1
https://hdl.handle.net/10057/30170

