Autoclave vacuum system and filter

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Authors
Goertz, Josh
Seneviratne, Waruna P.
Brummer, Brett
Jayathilaka, Prabodha
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Issue Date
2024-11-07
Type
Patent
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Goertz, J., Seneviratne, W.P., Brummer, B., & Jayathilaka, P., inventors; Wichita State University, assignees. Autoclave vacuum system and filter. United States patent US 20240367128 A1. 2024, November 7.
Abstract

An autoclave vacuum system uses two vacuum sources to selectively impart a vacuum. In an exemplary embodiment, the vacuum sources are different types, wherein the first vacuum source is a vacuum pump, and the second source is a Venturi vacuum. The autoclave vacuum system uses a valve system for controlling whether the first and/or second vacuum sources are fluidly coupled to the vacuum enclo­sure. The valve system allows the autoclave vacuum system to assume a plurality of different configurations chosen such that a constant desired pressure is attained in the autoclave. The valve system may be triggered by a control system configured to recognize and act upon autoclave requirements such as temperature, pressure, duration of use, and number of cycles.

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Description
WSU inventors: Waruna Seneviratne, Dept. of Aerospace Engineering, College of Engineering, Joshua Goertz, NIAR.
Application No: 18/654,347 filed May 3, 2024. Patent No: US 20240367128 A1 granted November 7, 2024.
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United States Patent and Trademark Office
European Patent Office
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