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    Thickness measurement of thin films by x-ray absorption

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    ME_IEEE_6.pdf (198.0Kb)
    Date
    1991-01
    Author
    Chaudhuri, J.
    Shah, S.
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    Citation
    Chaudhuri, J.; Shah, S.; , "Thickness measurement of thin films by x-ray absorption," Journal of Applied Physics , vol.69, no.1, pp.499-501, Jan 1991 doi: 10.1063/1.347691
    Abstract
    An x-ray diffraction method for determining thicknesses of thin films grown on single-crystal substrates is presented. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. The thickness of the thin film was computed from the absorption of the integrated diffracted x-ray intensity from the single-crystal substrate. Since the diffracted intensity from the film is not required, the film does not have to be single crystal in nature. Thus, thicknesses of less ordered, polycrystalline, or even amorphous films can be measured with high precision by this technique.
    Description
    The full text of this article is not available on SOAR. WSU users can access the article via IEEE Xplore database licensed by University Libraries: http://libcat.wichita.edu/vwebv/holdingsInfo?bibId=1045967
    URI
    http://dx.doi.org/10.1063/1.347691
    http://hdl.handle.net/10057/4065
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