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    Determination of thickness of multiple layer thin films by an x-ray-diffraction technique

    Date
    1994-10-01
    Author
    Chaudhuri, J.
    Hashmi, F.
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    Citation
    Chaudhuri, J.; Hashmi, F.; , "Determination of thickness of multiple layer thin films by an x-ray-diffraction technique," Journal of Applied Physics , vol.76, no.7, pp.4454-4456, Oct 1994 doi: 10.1063/1.357275
    Abstract
    An x-ray-diffraction method for determining the thickness of multiple layer thin films grown on a single-crystal substrate is presented. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. As an example of the application of the method, thicknesses of a double heterostructure system, namely AlAs/AlGaAs/GaAs, were determined. Good agreement was obtained between the results from x-ray measurement and scanning electron microscopy data, demonstrating the high precision of this technique.
    Description
    The full text of this article is not available on SOAR. WSU users can access the article via IEEE Xplore database licensed by University Libraries: http://libcat.wichita.edu/vwebv/holdingsInfo?bibId=1045954
    URI
    http://dx.doi.org/10.1063/1.357275
    http://hdl.handle.net/10057/4062
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