Determination of thickness of multiple layer thin films by an x-ray-diffraction technique
Chaudhuri, J. Hashmi, F.
Chaudhuri, J.
Hashmi, F.
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1994-10-01
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Chaudhuri, J.; Hashmi, F.; , "Determination of thickness of multiple layer thin films by an x-ray-diffraction technique," Journal of Applied Physics , vol.76, no.7, pp.4454-4456, Oct 1994
doi: 10.1063/1.357275
Abstract
An x-ray-diffraction method for determining the thickness of multiple layer thin films grown on a single-crystal substrate is presented. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. As an example of the application of the method, thicknesses of a double heterostructure system, namely AlAs/AlGaAs/GaAs, were determined. Good agreement was obtained between the results from x-ray measurement and scanning electron microscopy data, demonstrating the high precision of this technique.
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The full text of this article is not available on SOAR. WSU users can access the article via IEEE Xplore database licensed by University Libraries: http://libcat.wichita.edu/vwebv/holdingsInfo?bibId=1045954
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IEEE
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Journal of Applied Physics , vol.76, no.7, pp.4454-4456
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0021-8979