Thickness measurement of thin films by x-ray absorption

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dc.contributor.author Chaudhuri, J. en_US
dc.contributor.author Shah, S. en_US
dc.date.accessioned 2011-12-20T23:37:44Z
dc.date.available 2011-12-20T23:37:44Z
dc.date.issued 1991-01 en_US
dc.identifier.citation Chaudhuri, J.; Shah, S.; , "Thickness measurement of thin films by x-ray absorption," Journal of Applied Physics , vol.69, no.1, pp.499-501, Jan 1991 doi: 10.1063/1.347691 en_US
dc.identifier.issn 0021-8979 en_US
dc.identifier.uri http://dx.doi.org/10.1063/1.347691 en_US
dc.identifier.uri http://hdl.handle.net/10057/4065
dc.description The full text of this article is not available on SOAR. WSU users can access the article via IEEE Xplore database licensed by University Libraries: http://libcat.wichita.edu/vwebv/holdingsInfo?bibId=1045967 en_US
dc.description.abstract An x-ray diffraction method for determining thicknesses of thin films grown on single-crystal substrates is presented. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. The thickness of the thin film was computed from the absorption of the integrated diffracted x-ray intensity from the single-crystal substrate. Since the diffracted intensity from the film is not required, the film does not have to be single crystal in nature. Thus, thicknesses of less ordered, polycrystalline, or even amorphous films can be measured with high precision by this technique. en_US
dc.language.iso en_US en_US
dc.publisher IEEE en_US
dc.relation.ispartofseries Journal of Applied Physics , vol.69, no.1, pp.499-501 en_US
dc.title Thickness measurement of thin films by x-ray absorption en_US
dc.type Article en_US
dc.description.version Peer reviewed article en_US
dc.rights.holder © IEEE,1991 en_US

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