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dc.contributor.authorChaudhuri, J.en_US
dc.contributor.authorShah, S.en_US
dc.date.accessioned2011-12-20T23:37:44Z
dc.date.available2011-12-20T23:37:44Z
dc.date.issued1991-01en_US
dc.identifier.citationChaudhuri, J.; Shah, S.; , "Thickness measurement of thin films by x-ray absorption," Journal of Applied Physics , vol.69, no.1, pp.499-501, Jan 1991 doi: 10.1063/1.347691en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.347691en_US
dc.identifier.urihttp://hdl.handle.net/10057/4065
dc.descriptionThe full text of this article is not available on SOAR. WSU users can access the article via IEEE Xplore database licensed by University Libraries: http://libcat.wichita.edu/vwebv/holdingsInfo?bibId=1045967en_US
dc.description.abstractAn x-ray diffraction method for determining thicknesses of thin films grown on single-crystal substrates is presented. The equations, based on the kinematical theory of x-ray diffraction and the mosaic crystal model, were developed. The thickness of the thin film was computed from the absorption of the integrated diffracted x-ray intensity from the single-crystal substrate. Since the diffracted intensity from the film is not required, the film does not have to be single crystal in nature. Thus, thicknesses of less ordered, polycrystalline, or even amorphous films can be measured with high precision by this technique.en_US
dc.language.isoen_USen_US
dc.publisherIEEEen_US
dc.relation.ispartofseriesJournal of Applied Physics , vol.69, no.1, pp.499-501en_US
dc.titleThickness measurement of thin films by x-ray absorptionen_US
dc.typeArticleen_US
dc.description.versionPeer reviewed articleen_US
dc.rights.holder© IEEE,1991en_US


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